Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

Brand Name:ROYAL
Certification:CE certification
Model Number:RTAC-SP
Minimum Order Quantity:1 set
Delivery Time:12 weeks
Payment Terms:L/C, D/A, D/P, T/T
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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets


Au Gold Magnetron Sputtering on Silicon Wafers


Summary:

With PVD DC sputtering technology can deposit Au Gold metal thin film on glass slides, silicon wafers. Except Au gold deposition, other metal targets also available: Silver (Ag), Copper (Cu), Aluminum (Al), Chrome (Cr), Stainless Steel (SS316L), Titanium (Ti) to obtain either conductive of functional films or high glossary of aesthetic surface on various substrate materials.

The gold sputtering layer features:


1. Binding layer is essential to enhance substrate and metal film adhesion. Royal Technology has developed a range of matured coating recipes based on different applications, support our customers with professional advice.

2. The roughness (RMS - root mean square) < 40Å is expected for most of the applications. For certain scanning probe applications a lower roughness might be required, generally 1.5 ~ 4 nm.

4. Gold sputtering layer surface purity: a clean surface is required for applications that employ gold surface modifications. Depending on the PVD process used, level of vacuum in the system, original purity of the gold source (over 99.99% generally)


Keywords: Au gold nano-structure thin film deposition, Gold thin film magnetron sputtering, PVD gold sputtering, Gold Vacuum Metallizing System


Applications:


Laboratory of Universities, R&D department of metal materials manufactures, PVD Vacuum Coating Service Centers, mostly used in electronics industry as conductive layer and the sciences for microscope specimens etc.


Technical Specifications:


MODELRTAC0808-SP
TECHNOLOGYDC Sputtering + Ion source (for option)
MATERIALStainless Steel (S304)
CHAMBER SIZEΦ800*H800mm
CHAMBER TYPECylinder, vertical, 1-door
ROTARY RACK SYSTEMPlanetary/Central driving
DEPOSITION MATERIALGold, Aluminum, Silver, Copper, Chrome, Stainless Steel, Nickel, Titanium
DEPOSITION SOURCECylindrical / Planar Sputtering Cathodes: 2 or 3 for option.+ 3 Arc sources
REACTIVE GAS CONTROLMFC, 2/4 ways
CONTROLPLC(Programmable Logic Controller) +
Touch Screen
PUMP SYSTEMSV300B - 1 set (Leybold) 300m³/hr
Roots Pump - 1 set, 150L/S
Holding Pump - 1 set, 60m³/hr
Turbo Molecular Pump: - 1 set, 3500L/S
POWER SUPPLY

Bias power supply: 1*24 KW

DC sputtering power: 2*24KW

SAFETY SYSTEMNumerous safety interlocks to protect operators
and equipment
COOLINGRecycle Cooling Water
HEATINGHeaters, 9KW
POWER ELECTRICAL480V/3 phases/60HZ ( USA compliant)
460V/3 phases/50HZ ( Asia compliant)
380V/3 phases/50HZ ( EU-CE compliant)
FOOTPRINTL3200*W2600*H2000mm
TOTAL WEIGHT3.0 T
CYCLE TIME30~40 minutes (depending on substrate material,
substrate geometry and environmental conditions)
POWER MAX..50KW
AVERAGE POWER CONSUMPTION (APPROX.)20KW

PVD Gold Plating wafers



Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

China Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets supplier

Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

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