SiC Furnance SiC Ingot Growth Furnance 4inch 6inch 8inch PVT Lely TSSG LPE Method High Growth Rate

Brand Name:ZMSH
Minimum Order Quantity:1
Delivery Time:6-8moth
Payment Terms:T/T
Place of Origin:China
Supply Ability:5set/month
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Location: Shanghai Shanghai China
Address: Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
Supplier`s last login times: within 38 hours
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SiC furnance SiC Ingot Growth Furnance,4inch 6inch 8inch,PVT Lely TSSG LPE method High Growth Rate


SiC Ingot Growth Furnance‘s abstract


The SiC Ingot Growth Furnace is designed for efficient silicon carbide crystal growth using graphite resistance heating. It operates with a maximum heating temperature of 2300°C and a rated power of 80kW. The furnace supports energy consumption between 3500kW·h and 4500kW·h per cycle, with a crystal growth cycle ranging from 5D to 7D. The furnace's size is 2150mm x 1600mm x 2850mm, and it has a cooling water flow rate of 6m³/h. The furnace operates in a vacuum environment with argon and nitrogen as the atmospheric gases, ensuring high-quality ingot production.




SiC Ingot Growth Furnance‘s photo





Our SiC Ingot Growth Furnance‘ s Crystal Special Crystal Type


SiC has over 250 crystal structures, but only the 4HC type can be used for SiC power devices. ZMSH has successfully assisted clients in growing this specific crystal type multiple times using its own furnace.


Our SiC Ingot Growth Furnace is designed for high-efficiency silicon carbide (SiC) crystal growth, capable of processing 4-inch, 6-inch, and 8-inch SiC wafers. Using advanced techniques like PVT (Physical Vapor Transport), Lely, TSSG (Temperature Gradient Method), and LPE (Liquid Phase Epitaxy), our furnace supports high growth rates while ensuring optimal crystal quality.


The furnace is engineered to grow various SiC crystal structures, including the conductive 4H, semi-insulating 4H, and other crystal types, such as 6H, 2H, and 3C. These structures are crucial for the production of SiC power devices and semiconductors, which are essential for applications in power electronics, energy-efficient systems, and high-voltage devices.


Our SiC furnace ensures precise temperature control and uniform crystal growth conditions, enabling the production of high-quality SiC ingots and wafers for advanced semiconductor applications.





Our SiC Ingot Growth Furnance‘ s advantage


1-Unique thermal field design


  • The axial temperature gradient is controllable, the radial temperature gradient is adjustable, and the temperature profile is smooth, resulting in a crystal growth interface that is nearly flat, thus increasing the crystal utilization thickness.

  • Reduced raw material consumption: The internal thermal field is evenly distributed, ensuring a more uniform temperature distribution within the raw material, significantly improving powder utilization and reducing waste.

  • There is no strong coupling between the axial and radial temperatures, allowing for high-precision control of both axial and radial temperature gradients. This is the key to solving crystal stress and reducing crystal dislocation density.

2- High control precision


The SiC Ingot Growth Furnace is specifically designed to produce high-quality silicon carbide (SiC) crystals, which are crucial for semiconductor applications, including power electronics, optoelectronics, and energy-efficient devices. SiC is a vital material in the production of components that require high thermal conductivity, electrical efficiency, and durability. Our furnace is equipped with advanced control systems to ensure consistent, optimal performance and crystal quality.


The equipment offers exceptional precision, with a power supply accuracy of 0.0005%, gas flow accuracy of ±0.05 L/h, temperature control accuracy of ±0.5°C, and chamber pressure control accuracy of ±10 Pa. These precise parameters create a stable, uniform crystal growth environment, which is essential for producing high-purity SiC ingots and wafers with minimal defects.


The system’s key components, such as the Proportional Valve, Mechanical Pump, Vacuum Chamber, Gas Flow Meter, and Molecular Pump, work in tandem to ensure reliable performance, improve material utilization, and reduce the occurrence of defects. These elements contribute to the furnace’s ability to produce high-quality SiC crystals that meet the demanding standards of the semiconductor industry.


ZMSH’s technology integrates the latest advancements in crystal growth processes, ensuring the highest standards of SiC crystal production. With the ever-growing demand for high-performance SiC-based components, our equipment is engineered to support industries such as power electronics, renewable energy, and advanced technology development, driving innovations in energy-efficient solutions and sustainable applications.


3- Automated operation


Automatic Response Signal monitoring, signal feedback


Automatic Alarm Over-limit warning, dynamic safety


Automatic Control Real-time monitoring and storage of production parameters, remote access, and control.


Active Prompt Expert system, human-machine interaction


ZMSH’s SiC Furnace is equipped with advanced automation for efficient operation. It features automatic response with signal monitoring and feedback, automatic alarms for over-limit conditions, and automatic control for real-time parameter monitoring with remote access. The system also includes active prompts for expert support and seamless human-machine interaction.

These features reduce human dependency, enhance process control, and ensure high-quality SiC ingot production, supporting large-scale manufacturing efficiency.




Our SiC Ingot Growth Furnance‘ s data sheet


6inch sic furnance8inch sic furnance
PROJECTPARAMETERPROJECTPARAMETER
Heating MethodGraphite Resistance HeatingHeating MethodGraphite Resistance Heating
Input PowerThree-phase, five-wire AC 380V ± 10% 50Hz~60HzInput PowerThree-phase, five-wire AC 380V ± 10% 50Hz~60Hz
Max Heating Temperature2300°CMax Heating Temperature2300°C
Rated Heating Power80kWRated Heating Power80kW
Heater Power Range35kW ~ 40kWHeater Power Range35kW ~ 40kW
Energy Consumption per Cycle3500kW·h ~ 4500kW·hEnergy Consumption per Cycle3500kW·h ~ 4500kW·h
Crystal Growth Cycle5D ~ 7DCrystal Growth Cycle5D ~ 7D
Main Machine Size2150mm x 1600mm x 2850mm (Length x Width x Height)Main Machine Size2150mm x 1600mm x 2850mm (Length x Width x Height)
Main Machine Weight≈ 2000kgMain Machine Weight≈ 2000kg
Cooling Water Flow6m³/hCooling Water Flow6m³/h
Cold Furnace Limit Vacuum5 × 10⁻⁴ PaCold Furnace Limit Vacuum5 × 10⁻⁴ Pa
Furnace AtmosphereArgon (5N), Nitrogen (5N)Furnace AtmosphereArgon (5N), Nitrogen (5N)
Raw MaterialSilicon Carbide ParticlesRaw MaterialSilicon Carbide Particles
Product Crystal Type4HProduct Crystal Type4H
Product Crystal Thickness18mm ~ 30mmProduct Crystal Thickness≥ 15mm
Effective Diameter of Crystal≥ 150mmEffective Diameter of Crystal≥ 200mm



Our servise


Tailored One-Stop Solutions


We provide customized Silicon Carbide (SiC) furnace solutions, including PVT, Lely, and TSSG/LPE technologies, tailored to meet your specific needs. From design to optimization, we ensure our systems align with your production goals.


Client Training


We offer comprehensive training to ensure your team fully understands how to operate and maintain our furnaces. Our training covers everything from basic operations to advanced troubleshooting.


On-Site Installation and Commissioning


Our team personally installs and commissions the SiC furnaces at your location. We ensure smooth setup and conduct a thorough verification process to guarantee the system is fully operational.


After-Sales Support


We provide responsive after-sales service. Our team is ready to assist with on-site repairs and troubleshooting to minimize downtime and keep your equipment running smoothly.

We are dedicated to offering high-quality furnaces and continuous support to ensure your success in SiC crystal growth.

China SiC Furnance SiC Ingot Growth Furnance 4inch 6inch 8inch PVT Lely TSSG LPE Method High Growth Rate supplier

SiC Furnance SiC Ingot Growth Furnance 4inch 6inch 8inch PVT Lely TSSG LPE Method High Growth Rate

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