Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting

Brand Name:FUNSONIC
Certification:CE
Model Number:FS650
Minimum Order Quantity:1 UNIT
Payment Terms:T/T, Western Union
Place of Origin:CHINA
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Location: Hangzhou Zhejiang China
Address: No. 196 Shitashang Qiufeng Village, Fuchun Subdistrict, Fuyang District, Hangzhou City, Zhejiang Province, China. 311400
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Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting


Description:


Ultrasonic spraying protective film specific coating before silicon wafer cutting has been proven to be a reliable, repeatable, and efficient method for applying various chemicals to silicon before cutting, grinding, and polishing to protect the wafer and bumps. Common chemical substances include Z-Coat, PMMA, and other easily removable chemicals. FUNSONIC's nozzle system can be customized to meet customers' specific coating requirements and challenges for protective films before silicon wafer cutting.
The ultrasonic spraying protective film specific coating before silicon wafer cutting can be applied to any shape or size by controlling the thickness from submicron to over 100 microns. The coating system is a feasible alternative to other coating technologies such as rotary and traditional spraying.


Parameters:


Product Type

Laboratory desktop

FS620

Pilot type vertical

FS650

Online production type

FS680

FS1005
Spray nozzle operating frequency20-200KHz100KHz (120KHz或150KHz for select)
Nozzle power10-100W2~ 10W
Continuous spraying volume max20-1200ml/h/pcs,Scalable0.01-l/min
Effective spraying width2-260mm/pcs,Scalable1-5mm
Spray uniformity<5%<5%
Solution conversion rate≥95%≥95%
Dry film thickness20nm-100μm20nm-1μm
Solution viscosity≤50cps≤10cps
temperature range1-60℃1-60℃
Atomized particles (median value)10-45μm (Distilled water), determined by the frequency of the nozzle10-25μm(Distilled water), determined by the frequency of the nozzle
Diversion pressure max≤0.15MPA≤0.05MPa
input voltage220V±10%/50-60Hz220V±10%/50-60Hz

Advantages :


Ultrasonic nozzles have important applications in photolithography processing. Semiconductor manufacturers use ultrasonic spraying technology to spray photoresist developer on silicon and gallium arsenide chip substrates, which is a chemical substance that can display optical stepper imaging circuits. The spraying process involves inserting the nozzle above the chip, and then controlling the ultrasonic nozzle through XYZ three-axis and servo motor to evenly distribute the coating. As the spray of the ultrasonic nozzle is gentle and continuous, it can improve the chemical activity, improve the development efficiency, and reduce rebound and material waste. Data shows that ultrasonic spraying technology can save up to 70% of materials and improve control of critical dimensions.
Compared with traditional spin coating, the advantage of ultrasonic nozzles is that they can distribute materials more evenly and reduce the dependence of liquid distribution on surface tension. Traditional spin coating involves depositing materials in the form of puddles or streams onto a portion of a chip, and then dispersing them onto the surface through centrifugal force. This process requires precise control of temperature and solvent evaporation rate to ensure the integrity and uniformity of the coating. Ultrasonic nozzles, on the other hand, atomize the material onto the entire surface of the chip to form a continuous thin film. This way, there is no need to consider solvent evaporation and surface forces, and there will be no sputtering or backside deposition.


Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting



China Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting supplier

Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting

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