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Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting
Description:
Ultrasonic spraying protective film specific coating before silicon
wafer cutting has been proven to be a reliable, repeatable, and
efficient method for applying various chemicals to silicon before
cutting, grinding, and polishing to protect the wafer and bumps.
Common chemical substances include Z-Coat, PMMA, and other easily
removable chemicals. FUNSONIC's nozzle system can be customized to
meet customers' specific coating requirements and challenges for
protective films before silicon wafer cutting.
The ultrasonic spraying protective film specific coating before
silicon wafer cutting can be applied to any shape or size by
controlling the thickness from submicron to over 100 microns. The
coating system is a feasible alternative to other coating
technologies such as rotary and traditional spraying.
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Advantages :
Ultrasonic nozzles have important applications in photolithography
processing. Semiconductor manufacturers use ultrasonic spraying
technology to spray photoresist developer on silicon and gallium
arsenide chip substrates, which is a chemical substance that can
display optical stepper imaging circuits. The spraying process
involves inserting the nozzle above the chip, and then controlling
the ultrasonic nozzle through XYZ three-axis and servo motor to
evenly distribute the coating. As the spray of the ultrasonic
nozzle is gentle and continuous, it can improve the chemical
activity, improve the development efficiency, and reduce rebound
and material waste. Data shows that ultrasonic spraying technology
can save up to 70% of materials and improve control of critical
dimensions.
Compared with traditional spin coating, the advantage of ultrasonic
nozzles is that they can distribute materials more evenly and
reduce the dependence of liquid distribution on surface tension.
Traditional spin coating involves depositing materials in the form
of puddles or streams onto a portion of a chip, and then dispersing
them onto the surface through centrifugal force. This process
requires precise control of temperature and solvent evaporation
rate to ensure the integrity and uniformity of the coating.
Ultrasonic nozzles, on the other hand, atomize the material onto
the entire surface of the chip to form a continuous thin film. This
way, there is no need to consider solvent evaporation and surface
forces, and there will be no sputtering or backside deposition.
Ultrasonic Spraying Protective Film Specific Coating Before Silicon Wafer Cutting