RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

Brand Name:PRM
Certification:ISO9001
Model Number:Custom
Minimum Order Quantity:1pc
Delivery Time:5~7days
Payment Terms:T/T
Contact Now

Add to Cart

Site Member
Location: Baoji Shaanxi China
Address: No.188 Gaoxin Road,Weibin District Baoji City,Shaanxi,China
Supplier`s last login times: within 35 hours
Product Details Company Profile
Product Details

Product Information:


Tantalum tube target is a tubular tantalum target, also known as tantalum rotating target.


NameTantalum Rotating Target Tantalum Tube Target
Purity≥99.95%
GradeRO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Density16.68g/cm3
Atomic weight180.94788
Sputtering methodDC
Thermal conductivity57 W/m.K
Thermal expansion coefficient6.3 x 10-6 /K
SizeOD: 20~300mm Wall thickness: ≥ 0.5mm


Application of Ta Rotating Target:


Tantalum tube target is a high-purity tantalum raw material for sputter deposition, which can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Details are as follows:


-For semiconductors;
-Chemical Vapor Deposition (CVD) displays;
-Physical Vapor Deposition (PVD) displays;
-Optical applications.


Note: We provide customized services. If you can't find the target you want, please contact us directly. We can customize according to your requirements.


China RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD supplier

RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

Inquiry Cart 0