Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices

Brand Name:Jingtan
Certification:CE
Model Number:JT-0305-C
Minimum Order Quantity:1 set
Delivery Time:60 days
Place of Origin:China
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Location: Zhuzhou Hunan China
Address: Building B4,Xinma Industrial Park, 959 Tianyi Avenue, Tianyuan District,Zhuzhou City,Hunan Province,China
Supplier`s last login times: within 24 hours
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Product Details

The Vacuum deposition furnace is used for the preparation of carbon-carbon composite materials, and the deposition furnace is mainly used for the preparation of pyrolytic carbon coating on the surface of graphite, semiconductor devices and heat-resistant scour materials.


Scope of application:


Graphite, semiconductor devices, heat-resistant scour materials.

1. Basic Parameters:

1) Design temperature: 1250℃/1650℃/1800℃/2200℃

2) Common temperature: 900~1200℃

3) Vacuum degree: < 50Pa

4) Pressure rise rate: 6.67pA /h(or 150Pa/24h) in cold state of empty furnace

5) Heating mode: graphite resistance heating or induction heating, independent temperature control, good temperature uniformity

6) Atmosphere medium: vacuum /CH4/C3H6/H2/N2/Ar

7) Gas control mode: mass flow meter control, multi-channel gas path, uniform flow field, no deposition dead Angle, good deposition effect;

Multi-stage and efficient exhaust treatment system, environmentally friendly, easy to clean up;

8) Furnace type: square, round, vertical or horizontal structure (non-standard design), fully enclosed deposition chamber, good sealing effect, strong anti-pollution ability;

9) Furnace cooling mode: furnace shell water cooling, external circulation quick cooling system can be selected, short cooling time, high production efficiency;

2. Structure of vacuum deposition furnace:

Structure form: horizontal - side discharge, vertical - up/down discharge

Furnace door locking mode: manual/automatic

Furnace shell material: inner stainless steel/all stainless steel

Insulation material: carbon felt/graphite felt/carbon fiber cured felt

Heater, muffle material: graphite /CFC

Infrared instrument: single colorimetric/double colorimetric

Power supply: KGPS/IGBT(only suitable for medium frequency heating)

Produce Specification:


Parameter /Model No.JT-0305-CJT-0505-CJT-0608-CJT-0612-CJT-0812-CJT-1120-CJT-1218-CJT-1520-C

Working Zone Size

φ×H(mm)

300×500500×500600×800600×1200800×12001100×20001200×18001500×2000

Highest Temperature

(℃)

23002300230023002300230023002300
Temperature uniformity(℃)±5±5±5/±7.5±7.5/±10±7.5/±10±10/±15±10/±15±15/±20
Limit Vacuum Degree(Pa)1-1001-1001-1001-1001-1001-1001-1001-100

Pressure rise rate

(Pa/h)

0.670.670.670.670.670.670.670.67
Heating method

Resistance/induction

Resistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/induction
China Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices supplier

Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices

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