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High Capacity PID Adjustment Semiconductor Oven SEO Series Air Tightness
The semiconductor oven with nitrogen filled has strong
universality, high stability and high performance. It adopts high
capacity horizontal air recycling system, adopts special chamber
structure and sealing technology, with excellent air tightness and
temperature uniformity to meet the high performance requirements of
semiconductor products. This oven is suitable for curing
semiconductor wafers, IC packages (copper substrate, silver gel,
silica gel, epoxy resin), glass substrate and other products.
Core Technology:
01 High capacity horizontal air recirculation hot air system to
achieve high performance temperature uniformity
02 The chamber is fully sealed design, adopts stainless steel
plate, with good air tightness, saving nitrogen
03 High power high temperature resistant long axis motor, and large
size turbine blade, which can work stably in high temperature
environment for a long time
04 The heating rate is controllable, one-key operation for the
process profile setting, with cooling system for cooling, which can
effectively improve production efficiency
05 High precision temperature controller, PID adjustment, the
control accuracy can reach 0.5℃, reliable control, safe use
06 Efficient clean treatment, thousand-grade cleanroom aging test,
to meet the requirements of semiconductor dust-free workshops and
products
07 Low oxygen content control, real-time monitoring, dual channel
analysis system the oxygen content can be controlled within 50PPM
Product features:
SEMICONDUCTOR OVEN CHAMBER STRUCTURE
The upper and lower boxes are equipped with hot air circulation
system, the air speed and volume can be adjusted, and different
process parameters can be operated independently. The furnace
chamber is made of high quality stainless steel. The furnace is
equipped with layered brackets to improve space utilization.
SEMICONDUCTOR OVEN NITROGEN SYSTEM
Nitrogen filling inside the chamber, equipped with multiple flow
meter, with independent adjustment function, to ensure the
reasonable use of nitrogen, balanced distribution. With
multi-channel oxygen analyzer, real-time monitoring of the oxygen
content value in the upper and lower chambers, can be controlled
separately, the oxygen content of a single chamber can be
controlled within 500PPM (option: within 100PPM).
SEMICONDUCTOR OVEN COOLING SYSTEM
Water cooling system is adopted. Fin radiator blast water cooling,
when the temperature in the furnace is cooling, the blower will
exchange heat through the fin radiator quickly, it greatly shortens
the cooling time. Unique cooling system, avoid instant cooling
steam expansion at high temperature, which effectively protect
product quality.
SEMICONDUCTOR OVEN SAFETY PROTECTION SYSTEM
With over-temperature protection (to prevent the studio temperature
is too high and protect the product), when the over-temperature
situation occurs, it will immediately cut off the power, at the
same time, there is an alarm to remind the staff, better protection
for products; control and protection of excessive oxygen content;
nitrogen low pressure alarm protection; upper and lower boxes are
equipped with electronic safety locks, and the equipment has
emergency stop switch.
SEMICONDUCTOR OVEN CLARITY TEST
After testing, the concentration of 0.5μm particle is ≤35200, which
meets the production requirements of high-cleanliness
thousand-class clean dust-free workshop.
SEMICONDUCTOR OVEN TEMPERATURE PROFILE TEST
High precision temperature controller, PID regulation, high
capacity horizontal air recirculation hot air system, which can
achieve high performance temperature uniformity.
Product Parameters:
Model No | SEO-100N |
Box part | |
Box dimension | 700(L)*550(W)*(600*2)(H)mm |
Number of boxes and working mode | Two boxes, each box can run independently |
Hot air system | Hot air circulation system with adjustable air speed and volume |
Cooling system | Water cooling circulation system, according to customer workshop cooling water |
Nitrogen system | With flow meter and oxygen analyzer to display oxygen content in real-time |
Internal specification | Equipped with the stainless steel support shelves, with adjustable spacing between shelves |
Control system | |
Temperature operating range | Room temperature+10℃~250℃ |
Temperature control mode | PID closed-loop control+SSR drive |
Control system | PC+PLC electrical control system, Windows operating interface |
Temperature accuracy | ±0.5℃ |
Temperature uniformity | ±1.5%℃(no-load) |
Heating up time | ≤15min(200℃ no-load) |
Cooling rate | 2-5℃/min |
Heating power | 10KW*2 |
Oxygen content control | ≤500PPM (Option:≤50PPM) |
Working voltage | AC3Ø 5W 380V 50/60HZ |
Total power | 21KW |
MES communication protocol | Standard |
Cleanliness class | Class 1000 |
Machine Parameter | |
Dimension(LxWxH) | 1700(L)*1200(W)*1800(H)mm |
Weight | 500-800kg |
Color | Bright wrinkled white |
Notices:
1.Gas source requirements: Nitrogen working pressure (pressure
during use)>0.5-0.8Mpa, nitrogen purity 99.999%.
2.Power requirements:
①Three phase five wire: voltage 380V, frequency 50/60HZ;
②Wire diameter above 25mm², leakage protection switch 100A, leakage
protection switch leakage capacity 150-200mA.
3.Ground pressure requirement: 1000kg/m².
4.External ventilation requirements: 2-Ø38mm outer diameter air
duct, ventilation volume of 2*5M³/min;
5.Environmental requirements: The ambient temperature range should
be between 5-40℃, and the relative humidity range should be between
20-95%.