W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target

Model Number:Tungsten Sputtering Target
Minimum Order Quantity:Negotiate
Delivery Time:30 days after receiving down payment
Payment Terms:L/C, D/A, D/P, T/T
Price:Negitionable
Supply Ability:10000sets/month
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Location: Luoyang China
Address: Luoyang National University Science and Technology Park
Supplier`s last login times: within 1 hours
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Product Details

Tungsten Rotatable Sputtering Target


Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..


PARAMETER


OD(mm)

ID(mm)

Length(mm)

Custom Made

140-300

120-280

100-3300


Model Number

W1

Shape

customized

Chemical Composition

99.95% W


Feature


1.High density
2.High wear-resistant
3.High thermal conductivity with low thermal expansion coefficient
4.High vibration-damping capacity and high Young’s modulus
5.High oxidation resistance and corrosion resistance


Specification


Atomic number

74

CAS number

7440-33-7

Atomic mass

183.84 [g/mol]

Melting point

3420 °C

Boiling point

5555 °C

Density at 20 °C

19.25 [g/cm3]

Crystal structure

Body-centered cubic

Coefficient of linear thermal expansion at 20 °C

4.410-6[m/(mK)]

Thermal conductivity at 20 °C

164 [W/(mK)]

Specific heat at 20 °C

0.13 [J/(gK)]

Electrical conductivity at 20 °C

18.2106[S/m]

Specific electrical resistance at 20 °C

0.055 [(mm2)/m]


APPLICATIONS


semiconductor

chemical vapor deposition (CVD)

physical vapor deposition (PVD) display


China W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target supplier

W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target

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