5*10mm2 SP-Face (11-12) Un-Doped SI-Type Free-Standing GaN Single Crystal Substrate Resistivity > 10⁶Ω·Cm RF Device

Brand Name:GaNova
Certification:UKAS/ISO9001:2015
Model Number:JDCD01-001-014
Delivery Time:3-4 week days
Payment Terms:T/T
Place of Origin:Suzhou China
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Location: Shanghai Shanghai China
Address: Building 11, Lane 1333, Jiangnan Avenue, Changxing Town, Chongming District, Shanghai
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5*10mm2 SP-face (11-12) Un-doped SI-type free-standing GaN single crystal substrate Resistivity > 106 Ω·cm RF devices wafer



Overview

The GaN semiconductor device market includes key companies such as Cree, Infineon Technologies, Qorvo, MACOM, NXP Semiconductors, Mitsubishi Electric, Efficient Power Conversion (EPC), GaN Systems, Nichia Corporation, and Epistar Corporation.
Thin Epi wafers are commonly used for leading edge MOS devices. Thick Epi or Multi-layered epitaxial wafers are used for the devices mainly to control electric power, and they are contributing to improving the efficiency of energy consumption.

(11-22) face Free-standing GaN Substrates
Item

GaN-FS-SP-U-S


GaN-FS-SP-N-S


GaN-FS-SP-SI-S

5*10mm2 SP-Face (11-12) Un-Doped SI-Type Free-Standing GaN Single Crystal Substrate Resistivity > 10⁶Ω·Cm RF Device


Remarks:

A circular arc angle (R < 2 mm) is used for distinguishing the front and back surface.

Dimensions5 x 10 mm2
Thickness350 ±25 µm
Orientation

(11-22) plane off angle toward M-axis 0 ±0.5°

(11-22) plane off angle toward C-axis - 1 ±0.2°

Conduction TypeN-typeN-typeSemi-Insulating
Resistivity (300K)< 0.1 Ω·cm< 0.05 Ω·cm> 106 Ω·cm
TTV≤ 10 µm
BOW- 10 µm ≤ BOW ≤ 10 µm
Front Surface Roughness

< 0.2 nm (polished);

or < 0.3 nm (polished and surface treatment for epitaxy)

Back Surface Roughness

0.5 ~1.5 μm

option: 1~3 nm (fine ground); < 0.2 nm (polished)

Dislocation DensityFrom 1 x 105 to 3 x 106 cm-2
Macro Defect Density0 cm-2
Useable Area> 90% (edge exclusion)
PackagePackaged in a class 100 clean room environment, in 6 PCS container, under a nitrogen atmosphere

Appendix: The diagram of miscut angle


5*10mm2 SP-Face (11-12) Un-Doped SI-Type Free-Standing GaN Single Crystal Substrate Resistivity > 10⁶Ω·Cm RF Device

If δ1= 0 ±0.5°, then (11-22) plane off angle toward M-Axis is 0 ±0.5°.

If δ2= - 1 ±0.2°, then (11-22) plane off angle toward C-Axis is - 1 ±0.2°.


About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.


FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

China 5*10mm2 SP-Face (11-12) Un-Doped SI-Type Free-Standing GaN Single Crystal Substrate Resistivity > 10⁶Ω·Cm RF Device supplier

5*10mm2 SP-Face (11-12) Un-Doped SI-Type Free-Standing GaN Single Crystal Substrate Resistivity > 10⁶Ω·Cm RF Device

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