4H SiC Epitaxial Wafer 0.015Ω•cm—0.025Ω•Cm ≤4000/cm²150.0 mm +0mm/-0.2mm

Brand Name:GaNova
Certification:UKAS/ISO9001:2015
Model Number:JDCD03-001-003
Delivery Time:3-4 week days
Payment Terms:T/T
Place of Origin:Suzhou China
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Location: Shanghai Shanghai China
Address: Building 11, Lane 1333, Jiangnan Avenue, Changxing Town, Chongming District, Shanghai
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Product Details

4H SiC Epitaxial Wafer 0.015Ω•cm—0.025Ω•cm ≤4000/cm2 150.0 mm +0mm/-0.2mm

JDCD03-001-003


Overview

The next type is beta silicon carbide. Beta SiC is produced at temperatures higher than 1700 degrees Celsius. Alpha carbide is the most common, and has a hexagonal crystal structure similar to Wurtzite. The beta form is similar to diamond, and is used in a few applications. It has been the preferred choice in power semis for electric vehicles. Several third-party SiC wafer suppliers are currently working on this new material.


Property

P-MOS GradeP-SBD GradeD Grade
Crystal Form4H
PolytypeNone PermittedArea≤5%
(MPD) a≤0.2 /cm2≤0.5 /cm2≤5 /cm2
Hex PlatesNone PermittedArea≤5%
Hexagonal PolycrystalNone Permitted
Inclusions aArea≤0.05%Area≤0.05%N/A
Resistivity0.015Ω•cm—0.025Ω•cm0.015Ω•cm—0.025Ω•cm0.014Ω•cm—0.028Ω•cm
(EPD)a≤4000/cm2≤8000/cm2N/A
(TED)a≤3000/cm2≤6000/cm2N/A
(BPD)a≤1000/cm2≤2000/cm2N/A
(TSD)a≤600/cm2≤1000/cm2N/A
Stacking Fault≤0.5% Area≤1% AreaN/A

Surface Metal Contamination


(Al, Cr, Fe, Ni, Cu, Zn, Pb, Na, K, Ti, Ca ,V, Mn) ≤1E11 cm-2

Diameter150.0 mm +0mm/-0.2mm
Surface OrientationOff-Axis:4°toward <11-20>±0.5 °
Primary Flat Length47.5 mm ± 1.5 mm
Secondary Flat LengthNo Secondary Flat
Primary Flat OrientationParallel to<11-20>±1°
Secondary Flat OrientationN/A
Orthogonal Misorientation±5.0°
Surface FinishC-Face:Optical Polish,Si-Face:CMP
Wafer EdgeBeveling

Surface Roughness

(10μm×10μm)

Si Face Ra≤0.20 nm ; C Face Ra≤0.50 nm
Thickness a350.0μm± 25.0 μm
LTV(10mm×10mm)a≤2μm≤3μm
(TTV)a≤6μm≤10μm
(BOW) a≤15μm≤25μm≤40μm
(Warp) a≤25μm≤40μm≤60μm
Chips/IndentsNone Permitted ≥0.5mm Width and DepthQty.2 ≤1.0 mm Width and Depth

Scratches a

(Si Face,CS8520)

≤5 and Cumulative Length≤0.5×Wafer Diameter

≤5 and Cumulative Length≤1.5×Wafer

Diameter

TUA(2mm*2mm)≥98%≥95%N/A
CracksNone Permitted
ContaminationNone Permitted
PropertyP-MOS GradeP-SBD GradeD Grade
Edge Exclusion3mm

Remark: 3mm edge exclusion is used for the items marked with a.


About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.


FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

China 4H SiC Epitaxial Wafer 0.015Ω•cm—0.025Ω•Cm ≤4000/cm²150.0 mm +0mm/-0.2mm supplier

4H SiC Epitaxial Wafer 0.015Ω•cm—0.025Ω•Cm ≤4000/cm²150.0 mm +0mm/-0.2mm

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