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Titanium Tube Target Vacuum Coating Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840
Item name | Titanium tube target |
Size | φ133*φ125*840 |
Grade | Gr1 |
Packaging | Vacuum package in wooden case |
Port of place | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
The coating target is a sputtering source that forms various
functional films on the substrate by magnetron sputtering,
multi-arc ion plating or other types of coating systems under
appropriate technological conditions. To put it simply, the target
material is the target material of high-speed charged particles
bombardment. When used in high-energy laser weapons, different
power densities, different output waveforms and different
wavelengths of laser interact with different targets, different
killing and destruction effects will be produced. Vacuum coating
refers to heating metal or non-metal materials under high vacuum
conditions, so that it evaporates and condenses on the surface of
plated parts (metal, semiconductor or insulator) and forms a film
method. Vacuum coating technology is generally divided into two
categories, namely physical vapor deposition (PVD) technology and
chemical vapor deposition (CVD) technology. Physical vapor
deposition technology refers to the method of directly depositing
the plating material on the surface of the substrate by
gasification into atoms and molecules or ionization into ions by
various physical methods under vacuum conditions. Features:
(1) all kinds of coating technology need a specific vacuum
environment, in order to ensure that the film material in heating
evaporation or sputtering process formed by the movement of vapor
molecules, not by many atmospheric gas molecules collision, block
and interference, and eliminate the adverse effects of impurities
in the atmosphere.
(2) All kinds of coating technology need to have an evaporation
source or target, in order to vaporize the film material into gas.
Due to the continuous improvement of source or target, the
selection range of film-making materials has been greatly expanded.
Whether metal, metal alloy, intermetallic compound, ceramic or
organic material, all kinds of metal and dielectric films can be
steamed, but also different materials can be steamed at the same
time to get multilayer films.
(3) evaporation or sputtering film making materials, in the process
of forming a film with the workpiece to be plated, the film
thickness can be measured and controlled more accurately, to ensure
the uniformity of the film thickness.
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance