PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY
Brand Name:ZG
Certification:CE
Model Number:MS
Minimum Order Quantity:1 piece
Delivery Time:3 working days
Payment Terms:L/C, D/A, D/P, T/T, Western Union, MoneyGram
Contact Now
Add to Cart
Active Member
Location:
Zhengzhou Henan China
Address:
No. 26, Dongqing Street, High-tech Zone, Zhengzhou ,Henan, China
Supplier`s last login times:
within 48 hours
Product Details
Company Profile
Product Details
SiC PVD Tray
Silicon carbide PVD tray is formed by isostatic pressing process and sintering at high temperature. The outer diameter, thickness, number and size of acupoints, position and shape of the tablet groove can also be finished according to the requirements of the user's design drawings to meet the specific requirements of the user.
Typical applications
- Physical Vapor Deposition (PVD) process is used in LED chip manufacturing.
Features and advantages
- High density
- Good thermal conductivity, low coefficient of expansion and temperature uniformity
- Plasma impact resistance
- Resistant to all kinds of strong acid and alkali chemical reagent corrosion
- After semiconductor grade cleaning
Specifications 230/300/330mm
PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY
Inquiry Cart
0