ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Brand Name:XDEM
Certification:ISO, CE
Model Number:XDEM-1200T-PECVD
Minimum Order Quantity:1 set
Delivery Time:15 working days
Payment Terms:L/C, T/T, Western Union, MoneyGram
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Location: Nanyang Henan China
Address: 1-404 CITY SPRING GARDEN, FANLI ROAD, NANYANG CITY, HENAN PROVINCE, P.R. CHINA
Supplier`s last login times: within 28 hours
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Plasma Enhanced Chemical Vapor Deposition PECVD System Machine


PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable for the PECVD process, such as silicon carbide coating ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitors(MLCC) atomosphere sintering experiment,etc.


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Packing & Shipping:

Wooden box with polyfoam filled inside to ensure safe transportation.


Parcels can be sent by sea, by air, by express,etc per customer's request.


China ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System supplier

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

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