High Purity Pvd Titanium Sputtering Target Metal Target Customized

Brand Name:LHTI
Certification:ISO9001
Model Number:LH-10
Minimum Order Quantity:10 pieces
Delivery Time:15-20 days
Payment Terms:L/C, D/P, T/T, Western Union,paypal etc
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Verified Supplier
Location: Baoji Shaanxi China
Address: Room 2508, 25 / f, Unit 1, Block B, Wanrun International Plaza, Gaoxin 4th Road, Baoji City, Shaanxi Province, China
Supplier`s last login times: within 27 hours
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High purity pvd titanium sputtering target Metal target customized


Sputtering target can be devided into rotating target, plane target, multi-arc target according to the working principle.


It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can provide: alloy targets, zirconium aluminum ZrAl, nickel chromium NiZr, titanium aluminum TiAl, titanium nickel TiNi, nickel chromium NiCr,copper titanium TiCu etc. The metal ratio of the alloy target is titanium-aluminum alloy as an example: 50:50wt% mass ratio, 80:20at% atomic ratio.


Product name: titanium sputtering target

Purity: 99.5%, 99.95%, 99.98%, 99.995%.

Size: diameter 300*40mm, diameter 300*25mm, diameter100*40mm, diameter 99*40mm, diameter 65*40mm etc. Or as customers' drawings.

Material:

1. Pure titanium: GR1 GR2

2. Titanium alloy: Gr5 titanium, titanium aluminum TiAl, titanium nickel TiNi, titanium chromium TiCr, titanium zirconium TiZr,copper titanium TiCu etc.

3. Others material: Zirconium sputtering targets, chrome sputtering targets,tungsten sputtering targets,copper sputtering targets etc.

Applications: Decorative coating,Hardware tool coating,Semiconductor,Flat panel displays

Features: Competitive pricing, High purity,Grain refined, Engineered microstructure

(average grain size < 20 um),Semiconductor grade


Detailed images:


Vacuum coating : a method of making a film on a substrate under vacuum) can meet this accuracy requirement.


Advantages of vacuum coating: 1. This process does not produce industrial waste water, waste gas, or waste residue, and has great environmental advantages; 2. This process is a physical reaction (PVD physical vapor deposition), which will not damage the product Material and original performance; 3. Since the thickness of the produced film is micron nanometer level, and the film thickness is uniform, it will not damage the appearance and size of the product, and the accuracy is extremely high.


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China High Purity Pvd Titanium Sputtering Target Metal Target Customized supplier

High Purity Pvd Titanium Sputtering Target Metal Target Customized

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