Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

Brand Name:JINXING
Certification:ISO 9001
Model Number:Titanium Sputtering Target
Minimum Order Quantity:1kg
Delivery Time:10~25 work days
Payment Terms:L/C, D/A, D/P, T/T, Western Union
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Address: NO.57 KEXUEDADAO ROAD
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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

Ti Sputtering Targets Information:

It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material which is easily fabricated when heat is applied. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is biocompatible so it can be found in surgical tools and implants. Titanium is generally evaporated in vacuum for the purposes of wear and decorative, semiconductor, and optical coatings.

Customized Ti Sputtering Targets are available upon request. We can custom make the Ti sputtering targets to meet customer's specific requirements and drawings.

Titanium Sputtering Targets ( Ti target )

· Material: High purity (99.5%, 99.995%), ASTM grade 1, ASTM grade 2, TiAl6V4

· Standard: ASTM B 337/B338, ASTM B385-91,ASTM381, ISO 5832/2,JIS H4650,Din 17851

· Shape: Discs (Diameter <350mm), Thickness>1mm Rectangle (Length 1800mm, Width 400mm Thickness>1mm Tube ( Rotory target, OD: 20mm~160mm, Thickness: 2-20mm, Length: custom-made OD>160, Thickness >8mm, length <200)

· Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator

Ti Sputtering Targets picture:


Titanium Sputtering Target , Titanium Sputtering Target 99.95%

are available in varying sizes

D100x40mm , D65x6.35mm etc


Product NameElementPurirtyMelting Point Density (g/cc)Available Shapes
High Pure SliverAg4N-5N96110.49Wire, Sheet, Particle, Target
High Pure AluminumAl4N-6N6602.7Wire, Sheet, Particle, Target
High Pure GoldAu4N-5N106219.32Wire, Sheet, Particle, Target
High Pure BismuthBi5N-6N271.49.79Particle, Target
High Pure CadmiumCd5N-7N321.18.65Particle, Target
High Pure CobaltCo4N14958.9Particle, Target
High Pure ChromiumCr3N-4N18907.2Particle, Target
High Pure CopperCu3N-6N10838.92Wire, Sheet, Particle, Target
High Pure FerroFe3N-4N15357.86Particle, Target
High Pure GermaniumGe5N-6N9375.35Particle, Target
High Pure IndiumIn5N-6N1577.3Particle, Target
High Pure MagnesiumMg4N6511.74Wire, Particle, Target
High Pure MagnesiumMn3N12447.2Wire, Particle, Target
High Pure MolybdenumMo4N261710.22Wire, Sheet, Particle, Target
High Pure NiobiumNb4N24688.55Wire, Target
High Pure NickelNi3N-5N14538.9Wire, Sheet, Particle, Target
High Pure LeadPb4N-6N32811.34Particle, Target
High Pure PalladiumPd3N-4N155512.02Wire, Sheet, Particle, Target
High Pure PlatinumPt3N-4N177421.5Wire, Sheet, Particle, Target
High Pure SiliconSi5N-7N14102.42Particle, Target
High Pure TinSn5N-6N2327.75Wire, Particle, Target
High Pure TantalumTa4N299616.6Wire, Sheet, Particle, Target
High Pure TelluriumTe4N-6N4256.25Particle, Target
High Pure TitaniumTi4N-5N16754.5Wire, Particle, Target
High Pure TungstenW3N5-4N341019.3Wire, Sheet, Particle, Target
High Pure ZincZn4N-6N4197.14Wire, Sheet, Particle, Target
High Pure ZirconiumZr4N14776.4Wire, Sheet, Particle, Target

China Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating supplier

Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

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