Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation

Brand Name:CSTI
Certification:ISO9001
Model Number:20221010
Minimum Order Quantity:1piece
Delivery Time:7~20 work days
Payment Terms:T/T, L/C
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Location: Baoji China
Address: No.26 Baotai Road, Weibin District, Baoji City
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation

Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum.

ItemPurityDensityCoating colorShapeStandard size
Titanium Aluminum(TiAl) Alloy target2N8-4N3.6-4.2Rose gold/coffee/champagne goldcylinder/planar(D)70/100*(H)100-2000mm

PVD decorative coating

&hard coating

Pure chrome (Cr)target2N7-4N7.19gun grey/blackcylinder/planar(D)70/100*(H)100-2000mm
Pure Titanium(Ti) target2N8-4N4.51gold/rose gold/blue/rainbow/light black/gun greycylinder/planar(D)70/100*(H)100-2000mm
Pure Zirconium(Zr) target2N5-4N6.5light goldcylinder/planar(D)70/100*(H)100-2000mm
Pure Aluminium(Al) target4N-5N2.7silvercylinder/planar(D)70/100*(H)100-2000mm
Pure Nickel (Ni) target3N-4N8.9nickelcylinder/planar(D)70/100*(H)100-2000mm
Pure Niobium (Nb) target3N8.57whitecylinder/planar(D)70/100*(H)100-2000mm
Pure Tantalum(Ta) target3N516.4black/purecylinder/planar(D)70/100*(H)100-2000mm
Pure Molybdenum (Mo) target3N510.2blackcylinder/planar(D)70/100*(H)100-2000mm
Remarks: Size can be customizaed according to specical requirements

Application Field
Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition(PVD)
Used for optics including wear protection, decorative coatings, and displays

Product Advantage

01 High chemical purity

02 Low gas content

03 Close to 100% density

04 Uniform grains

05 Dense and homogeneous inner structure

Metal sputtering targets used in various physical vapor deposition (PVD) and evaporation coating applications

including the deposition of thin films onto a variety of substrates. Here are some details about the specific metals:

1.Titanium: Titanium sputtering targets are commonly used in PVD and evaporation coating applications to deposit thin films onto a range of substrates. Titanium is a popular material for use in coatings because it is both biocompatible and has excellent mechanical properties

2.Aluminum: Aluminum sputtering targets are also used in PVD and evaporation coating applications, especially in the production of reflective coatings and electronic components. Aluminum coatings have good electrical conductivity and are highly reflective, making them ideal for use in optical and electronic applications.

3.Chrome: Chrome sputtering targets are used in PVD and evaporation coating applications for a range of industrial and decorative purposes, including the production of decorative coatings, automotive components, and electronic components.

4.Zirconium: Zirconium sputtering targets are commonly used in PVD and evaporation coating applications for their high melting point and excellent resistance to corrosion. Zirconium coatings are commonly used in the production of decorative coatings and high-performance electronic components.

5.Nickel: Nickel sputtering targets are widely used in PVD and evaporation coating applications, especially in the production of magnetic thin films and coatings for electronic components. Nickel coatings are also commonly used in decorative applications.

6.Niobium: Niobium sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent chemical resistance. Niobium coatings are commonly used in the production of high-performance electronic components and optical coatings.

7.Tantalum: Tantalum sputtering targets are used in PVD and evaporation coating applications for their high melting point, excellent chemical resistance, and low vapor pressure. Tantalum coatings are commonly used in the production of capacitors, electronic components, and medical implants.

8.Molybdenum: Molybdenum sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent electrical conductivity. Molybdenum coatings are commonly used in the production of high-performance electronic components and optical coatings.

China Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation supplier

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation

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